For Glass Panel Exposure
The Large Substrate Exposure System is designed for markets requiring exposure of large glass panels. Using OAI’s advanced beam optics, the system utilizes a UV light source with beam size from 12in² to 20in² using while applying 1kW to 8kW lamp powers. This provides a uniform beam of ±10%. The system enables a printing resolution of ≤2.0μ. The system can handle a wide variety of substrate thickness from thin to thick and bonded panels. OAI’s Large Substrate Exposure System is the total package for performance, dependability, and repeatability for exposure of large area glass panels.
