Photolithography

Model 30 UV Light Source
The OAI Model 30 UV Light Source (shown with optional stand) consists of a stand-alone light source, a constant intensity...
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Model 200 Tabletop Mask Aligner
The OAI Model 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven...
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Model 30E Enhanced UV Light Source
The OAI UV Model 30E Enhanced UV Lightsource consists of a stand-alone Model 30 UV Lightsource, a constant intensity controller,...
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Model 200IR Tabletop Front & Backside Mask Aligner
The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative...
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Model 30L Large Area UV Light Source
The OAI UV Light Source Grande is a large area collimated light source. The device is available with output power up to 10KW....
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200E DUV Mask Aligner
Extreme DUV Mask Aligner 170nm-200nm OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200...
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Model 32 UV LED Light Source
This new UV LED lightsource is designed and engineered by the proven lithography experts at OAI. The lightsource delivers...
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Model 212 Large Area Mask Aligner
Low-Cost Table Top Mask Aligner for Large Area Substrates In response to industry demands for a low cost R&D mask aligner...
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Model 2000AF & 2000SM Exposure Systems
The OAI Model 2000 Exposure Systems may be configured as either an edge-bead exposure system (2000SM) or a flood exposure...
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Model 800E Front & backside, Semi-automatic Mask Aligner
The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found...
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Model 2012AF & 2012SM Exposure Systems
The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. Designed to accommodate...
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Model 6000: Automated Front & Backside Mask Aligner System
For Production Semiconductors, MEMS, Sensors, Advanced Packaging, IOT, Microfluidics With over 4 decades of manufacturing...
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Model 6000A-MC
Automated Mask Aligner with integrated mask changer The Model 6000A-MC is a precision system combining OAI’s Model...
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Model 6020 Large Substrate Mask Aligner
The Model 6020 is a large substrate Production Mask Aligner or Auto-flood Exposure System for RDL First Level Advanced Packaging...
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Nanoimprint Module
OAI’s Nanoimprint Module System is a modular add-on that may be used on any mask aligner. This innovative technology...
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Model 308 UV Light Meter
Dependable and repeatable, The OAI Model 308 UV Light Meter is precise, direct-reading instrument designed to measure UV...
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Model 308T UV Light Meter
Built for high intensity applications the NEW OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed...
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Model 656 Light and Energy Meter
OAI Model 656 Meter is designed for use with all mask aligners and flood exposure systems. For over 45 years, OAI is a world...
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Model 659 Light and Energy Meter
UV Light and Energy Meter for use with all wafer steppers. For over 45 years, OAI is a world leader in UV Light and Energy...
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AML Wafer Bonder 
Wafer bonding has found many applications in the field of MST, MEMS and micro engineering. These include the fabrication...
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Single Level Tooling Module
Collimated modular unit with excellent uniformity
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UV Ozone Surface Treatment Plus
UV Ozone Treatment System Plus improves surface adhesion. ■ UV Ozone Treatment Systems available for R&D through production...
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Mask Treatment Process - Model 100MT
OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and...
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Contact Liquid Polymer Process (CLiPP) for Micorfluidic Devices
CLiPP Contac Liquid Polymer Process is a fabrication process designed for the prototyping and manufacture of microfluidic...
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Service and Support
We invite you to consider OAI as your technology partner. OAI combines innovative design and manufacturing expertise with...
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