Model 2012AF & 2012SM Exposure Systems

The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure.

The Model 2012SM Automated Edge-Bead Exposure System provides a cost-effective method for edge-bead removal using standard shadow mask technology.

Both models allow for rapid and efficient mask and substrate changeover, adding to both versatility and high-volume throughput of this production tool. Additionally, they are designed to accommodate wafers from 8″ to 300mm and the tool features automated FOUP loading.

Come visit OAI at SPIE in San Jose, CA – Booths 711 and 713 with our partners C&D Semiconductors