The OAI Model 800E front and backside, semi-automatic mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this mask aligner, OAI meets the growing challenge of the dynamic semiconductor and MEMS market with a new class of mask aligners that are engineered for R&D and low volume production.
Built on OAI’s proven modular platform, the Model 800E is an enhanced, high-performance, high-resolution lithography system which delivers a level of performance that is offered at an extremely compelling price point. The aligner system features OAI’s Advanced Beam Optics which delivers exceptional uniformity. Upgradable using OAI’s Precision Lithography Modules, the Model 800E is a highly versatile tool in the lab or in low-volume production. The Model 800E utilizes a Windows 7 PC control platform with extensive recipe storage capacity. The system also comes with joystick-controlled alignment and optics stages, and can be configured with non-contact, 3-point wedge effect correction and auto-align capability. These combined features are typically found in automated production mask aligner systems but are now available on the Model 800E at a more affordable price.
The Model 800E is unique owing to the inclusion of advanced features which are found in the OAI Model 6000 production mask aligner tool. By utilizing the proven OAI modular mask aligner platform, we are able to adopt technology from our more advanced tools to produce a powerful system at a more affordable price.
