The alignment module features mask insert sets and quick-change wafer chucks that facilitate the use of a variety of substrates and masks without requiring special tools for reconfiguration. The alignment module incorporates micrometers for X, Y, and Z axes.

The Model 200 Mask Aligner features a dependable OAI UV Light Source which provides collimated UV light in Near or Deep UV using lamps ranging in power from 200W to 2000W. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. This mask aligner is a flexible, economic solution for any entry-level mask alignment and UV exposure application and is also available with a LED Light Source.

This mask aligner features a dependable OAI light source that provides collimated UV light in Near or Deep UV using lamps ranging in power from 200W to 2000W. Dual-sensor, optical feedback loops are linked to the constant intensity controller to provide control of exposure intensity within ±2% of the desired intensity. Changes may be made to the UV wavelength quickly and easily. The Model 200IR Mask Aligner is a flexible, economic solution for any entry-level mask alignment and UV exposure application for MEMS, Microfluidics, and NIL.

OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200 Mask Aligner but utilizes a 185nm Excimer Lamp as the UV light source. It is used for biotechnology processing.

In response to industry demands for a low-cost R&D mask aligner for larger substrates (up to 12″x12″ or 300mm diameter), OAI has developed the Model 212 Tabletop Mask Aligner. The mask aligner is based on OAI’s proven modular approach, leveraging OAI’s extensive experience with the Model 200 Tabletop Mask Aligner. The exemplary OAI Model 200 Mask Aligner is an entry-level tool that is installed in R&D labs worldwide.

The Model 212 Mask Aligner is engineered to accommodate 12″x12″ or 300mm substrates as well as smaller size mask inserts and substrate holders, thus adding to the versatility of the tool. The Model 212 is especially useful for research and development labs and has quickly gained acceptance in labs worldwide. With our modular design approach, OAI offers the highest quality precision mask aligners at the lowest total cost of ownership. The Model 212 Mask Aligner fills the void for those researchers who require a versatile, cost effective 300mm mask aligner system for R&D.

Built on OAI’s proven modular platform, the Model 800E is an enhanced, high-performance, high-resolution lithography system which delivers a level of performance that is offered at an extremely compelling price point. The aligner system features OAI’s Advanced Beam Optics which deliver exceptional uniformity. Upgradable using OAI’s Precision Lithography Modules, the Model 800E is a highly versatile tool in the lab or in low-volume production. The Model 800E utilizes a Windows 7 PC control platform with extensive recipe storage capacity. The system also comes with joystick-controlled alignment and optics stages and can be configured with non-contact, 3-point wedge effect correction, and auto-align capability. These combined features are typically found in automated production mask aligner systems but are now available on the Model 800E at a more affordable price.

The Model 800E is unique owing to the inclusion of advanced features which are found in the OAI Model 6000 production mask aligner tool. By utilizing the proven OAI modular mask aligner platform, we are able to adopt technology from our more advanced tools to produce a powerful system at a more affordable price.