Photolithography

The OAI Model 30 UV Light Source (shown with optional stand) consists of a stand-alone light source, constant intensity controller,...

Model 200 Tabletop Mask Aligner

The OAI Model 200 Mask Aligner is a cost-effective high performance mask aligner that has been engineered with industry proven...

Model 30E Enhanced UV Light Source

The OAI UV Model 30E Enhanced UV Light Source consists of a stand-alone Model 30 UV Light Source, a constant intensity controller,...

Model 200IR Tabletop Frontside & Backside Mask Aligner

The OAI Model 200IR Mask Aligner is a tabletop system that requires minimal clean room space. It is a cost-effective alternative...

Model 30L Large Area UV Light Source

The OAI Model 30L Large Area UV Light Source is a large area collimated light source. The device is available with output...

200E DUV Mask Aligner

Extreme DUV Mask Aligner 170nm-200nm OAI’S Model 200E DUV Mask Aligner performs all the functions of the tabletop Model 200...

Model 32 UV LED Light Source

This UV LED light source is designed and engineered by the proven lithography experts at OAI. The light source delivers a...

Model 212 Large Area Mask Aligner

Low-Cost Tabletop Mask Aligner for Large Area Substrates In response to industry demands for a low-cost R&D mask aligner...

Model 2000AF & 2000SM Exposure Systems

The OAI Model 2000 Exposure Systems may be configured as either an Edge-Bead Exposure System (2000SM) or a Flood Exposure...

Model 800E Front & Backside, Semi-Automatic Mask Aligner

The OAI Model 800E Frontside & Backside Semi-Automatic Mask Aligner system offers advanced features and specifications...

Model 6000: Automated Front & Backside Mask Aligner System

For Production Semiconductors, MEMS, Sensors, Advanced Packaging, IOT, Microfluidics With over five decades of manufacturing...

Model 2012AF & 2012SM Exposure Systems

The Model 2012AF Flood Exposure System provides a cost-effective method for automated flood exposure. The Model 2012SM Automated...

Model 6000A-MC

Automated Mask Aligner with integrated mask changer The Model 6000A-MC is a precision system combining OAI’s Model...

Model 6020 Large Substrate Mask Aligner

For RDL Panel Packaging & Glass Panel Exposure The Large Substrate Exposure System is designed for markets requiring...

Nanoimprint Module

OAI’s Nanoimprint Module System is a modular add-on that may be used on any mask aligner. This innovative technology...

Model 308 UV Light Meter

Dependable and repeatable, the OAI Model 308 UV Light Meter is a precise, direct-reading instrument designed to measure UV...

Model 308T UV Light Meter

Built for high intensity applications, the OAI Model 308T UV Light Meter is a dependable, direct-reading instrument designed...

Model 656 Light and Energy Meter

OAI Model 656 Meter is designed for use with all mask aligners and flood exposure systems. For over 50 years, OAI has been...

UV Light and Energy Meter for use with all wafer steppers

For over 50 years, OAI has been world leader in UV Light and Energy Measurement instrumentation used for reliable accurate...

AML Wafer Bonder

Wafer bonding has found many applications in the field of MST, MEMS, and micro-engineering. These include the fabrication...

UV Ozone Surface Treatment Plus

UV Ozone Treatment System Plus improves surface adhesion. ■ UV Ozone Treatment Systems available for R&D through production...

Single Level Tooling Module

Collimated modular unit with excellent uniformity

Contact Liquid Polymer Process (CLiPP) for Micorfluidic Devices

CLiPP Contac Liquid Polymer Process is a fabrication process designed for the prototyping and manufacture of microfluidic...

Mask Treatment Process - Model 100MT

OAI offers a unique process which extends the life of your mask, says good bye to tedious washing and drying of mask and...

Service and Support

We invite you to consider OAI as your technology partner. OAI combines innovative design and manufacturing expertise with...

Photolithography

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